1. Wafer cleaning machine (semiconductor, mobile phone camera).
Ø Dedicated to cleaning wafers (Wafer) or glass surface dust after cutting, high-speed centrifugal dehydration, no water marks left on the surface of the workpiece.
Ø The use of two-fluid cleaning device can effectively improve the cleaning effect.
Ø Equipped with anti-static ion wind system.
Ø Equipped with an air filtration system, the use of compressed air is cleaner.
Ø The overall stainless steel mirror body is strong and durable, resistant to acid, alkali and other cleaning fluids.
| Work table height: | 900MM |
| Number of cavities: | 2PCS |
| Cleaning arm: | 2 pieces, horizontal and one-way reciprocating movement. |
| Rotary spindle: | The spindle adopts OMRON high-precision servo control system, with a maximum speed of 3000RPM and an accuracy of ±5RPM. |
| Control method: | adopt industrial computer and PLC control system, easy to use and simple. |
| Airtightness: | The equipment is sealed as a whole, and the front of the production line is equipped with a push-pull transparent door to prevent the smell of the medicine from being emitted. The equipment is equipped with an exhaust system to ensure the cleanliness of the operation room and protect the health and safety of the operators. |
| Safety: | The bottom of the device is equipped with a KEYENCE leak-proof inspection belt, and an alarm will be issued immediately when any leakage drops onto the detection belt. |
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